定量表面分析

Abstract Detailed understanding of the mechanism responsible for the electron–solid interaction (or surface sensitivity) is a prerequisite for quantitative analysis employing electron beam techniques. In the past decade, significant developments have taken place in this field. On one hand, both the availability as well as the accuracy of the fundamental physical data needed to describe the surface sensitivity have improved. At the same time, the physical model for the surface sensitivity has been constantly refined. These developments combined have led to a firm common basis for quantitative understanding of a large variety of diverse electron beam techniques including electron probe microanalysis (EPMA), total electron yield (TEY), X-ray photoelectron spectroscopy (XPS), Augerelectron spectroscopy (AES), reflection electron energy loss spectroscopy (REELS), elastic peak electron spectroscopy (EPES), Auger photoelectron coincidence spectroscopy (APECS) and the like. These developments are reviewed and their impact on quantitative surface analysis is discussed.