ICP-OES法测定高纯铜中的杂质元素(Varian 英文)

Introduction了The determination of trace mpurities in high-purity metals and alloys is an important part of the qualitycontrol process in the manufacture of these materials. Trace impurities can have major effects on the properties of the finished products, and in many cases it is desirable to minimize, or at least to be able to control, the levels of certain trace impurities. For example, the level of Ag and S in high-purity Cu wire may be required not to exceed 0.1 parts per million (ppm)1.