使用配备外部气体控制模块的 Agilent 4200 MP-AES 测定异丙醇中的痕量元素

Isopropyl alcoho l (IPA) is one of the most commonly used organic solvents in the semiconductor industry. Silicon wafers are dried after surface cleaning in the manufacturing process and IPA is frequently used during the drying step. The purity of IPA used is critical since these materials come in direct contact with the silicon wafers and any contaminants present at this stage could be detrimental to the overall performance of the final product. Plasma - based instrument ation is widely used in the semiconductor industry due to its multielement capability and sensitivity compared to techniques such as Flame Atomic Absorption Spectroscopy (FAAS). However a robust plasma is required for the analysis of organic matrices. M icrowave Plasma Atomic Emission Spectroscopy (MP - AES) uses magnetically - coupled microwave energy to generate a stable plasma that is highly suited to the analysis of organic solvents. The Agilent 4200 MP - AES features an advanced microwave cavity and a torch designed to handle a wide range of samples, with better detection limits and an increased working range, compared to FAAS. Major elements (Ca, K, Na and Mg) in IPA can be easily determined using MP - AES with little sample preparation.