您还有0次抽奖机会
锤子
消耗积分 : 免积分
The Plasma Prep™ X utilizes an anisotropic, parallel plate design to eliminate “undercutting” samples during the etching process. The system incorporates solid-state technology, an integrated vacuum gauge, and dual gas inputs for precise gas blending.
打开失败或需在电脑查看,请在电脑上的资料中心栏目,点击"我的下载"。建议使用手机自带浏览器。