其他null检测 | 使用MM-16椭圆偏振光谱仪表征AIN的光学特性-HORIBA（中国）

方案摘要

方案下载

应用领域	半导体
检测样本	其他
检测项目
参考标准	0

The feasibility of using the MM-16 SE in measuring thickness and refractive index of AlN thin and thick films has been demonstrated. Non destructive measurement of thickness was successfully applied to films as thick as 3μm deposited on Si. The multi-layer models with a surface layer with void and the simple dispersion gave useful information about surface roughness, film density and oxygen contamination.

方案下载

配置单

HORIBA UVISEL Plus研究级经典型椭偏仪
型号：UVISEL

面议
咨询

方案详情

The feasibility of using the MM-16 SE in measuring thickness and refractive index of AlN thin and thick films has been demonstrated. Non destructive measurement of thickness was successfully applied to films as thick as 3µm deposited on Si. The multi-layer models with a surface layer with void and the simple dispersion gave useful information about surface roughness, film density and oxygen contamination.

上一篇颗粒分析+混合氧化石墨烯+分散状态的混合比例

下一篇使用椭圆偏振光谱仪表征铁电薄膜PbZr1-xTixO3&BA1-xSrxTiO3

文献贡献者

HORIBA（中国）

白金会员丨第22年

查看全部资料