Elaboration of 1μm square arrays of octadecyltrimethoxysilane monolayers on SiO2/Si by combining chemical vapour deposition and nano-imprint lithography

2008/04/03   下载量： 81 次

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Local chemical grafting of OctadecylTriMethoxySilane (OTMS) on SiO2/Si substrates has been successfully performed on specific micrometric areas by combining nano-imprint lithography and Chemical Vapour Deposition (CVD). The optimisation of the CVD experimental conditions using atomic force microscopy has lead to homogeneous 1 μm square arrays of OTMS monolayers on millimetric areas.

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