氮化硅窗口_价格-海德创业（北京）生物科技有限公司

产品详情

氮化硅窗口Silicon Nitride Window Grids

76042 氮化硅窗口.jpg

氮化硅TEM窗口在恶劣的实验室条件下表现良好，硅材料的框架100μm厚，适合标准的3mm支架和大多数双倾斜样品台，氮化硅窗口装在透明的凝胶盒中。

l 等离子可清洗-可以耐受强力等离子清洗，移去有机污染层

l 场到场的均匀性-整个薄膜厚度的变化小于0.5 nm

l 可容忍1000°C以上的温度-支持在高温下观察动态过程中使用

l 经得起严酷的条件-提供理想的成像分辨率，化学稳定性和机械强度

l 氮化硅采用LPCVD法制造，具有平坦，绝缘和疏水表面

选择参考

High Resolution Imaging:	5nm	76042-43, 1 square (25x25μm) 76042-44, 9 squares (50x50μm) 76042-45, 2 slots (50x1500μm)*
Robust, Increased High Resolution:	10nm	76042-46, 9 squares (100x100μm)
Everyday Imaging:	20nm	76042-49, 1 square (500x500μm) 76042-50, 9 squares (100x100μm)
Demanding Conditions:	50nm	76042-53, 1 square (100x100μm) 76042-52, 1 square (500x500μm) 76042-51, 1 square (1000x1000μm) 76042-50, 9 squares (100x100μm)
Materials & Cryo-EM Suspension:	Microporous	76042-41, 1 square (500x500μm) 76042-40, 1 square (500x500μm)

*Coated with 1 nm of ultrahigh purity carbon to minimize charging

产品选购：

货号	产品描述	窗口尺寸	厚度	规格
76042-40	Silicon Nitride Microporous TEM Window Grid (2.0 μm pores with labeled grid)	500μm sq.	20nm	10/pk
76042-41	Silicon Nitride Microporous TEM Window Grid (2.0 μm pores with labeled grid)	500μm sq.	50nm	10/pk
76042-42	Silicon Nitride Nanoporous TEM Window Grid	500μm sq.	20nm	10/pk
76042-43	Silicon Nitride TEM Window Grid	25μm sq.	5nm	10/pk
76042-44	Silicon Nitride TEM Window Grid	(8) 50μm sq., (1) 50x100μm	5nm	10/pk
76042-45	Silicon Nitride TEM Window Grid	(2) 50x1500μm	5nm	10/pk
76042-46	Silicon Nitride TEM Window Grid	(8) 100 sq., (1) 100x350μm	10nm	10/pk
76042-47	Silicon Nitride TEM Window Grid	(8) 250 sq., (1) 250x500μm	10nm	10/pk
76042-48	Silicon Nitride TEM Window Grid	(8) 100 sq., (1) 100x350μm	20nm	10/pk
76042-49	Silicon Nitride TEM Window Grid	500μm sq.	20nm	10/pk
76042-50	Silicon Nitride TEM Window Grid	(9) 100μm sq.	50nm	10/pk
76042-51	Silicon Nitride TEM Window Grid	1000μm sq.	50nm	10/pk
76042-52	Silicon Nitride TEM Window Grid	500μm sq.	50nm	10/pk
76042-53	Silicon Nitride TEM Window Grid	100μm sq.	50nm	10/pk