XENOS Nano Pattern Gernerator,可以使实验室现有扫描电镜,FIB或双束系统升级为高速(10MHZ 或 40MHZ)纳米图形发生装置可广泛应用到半导体领域,光电子技术,微机电系统的研发和微器件的制作。
NanoPattern图形发生器可以附加在扫描电镜/FIB上来控制电子束/离子束在衬底上直接制作微纳米图形,而不像普通光刻机需要先制作掩膜,并且有更高的分辨率和灵活性,又比专用的电子束光刻机经济,已经日渐成为纳米相关的科研中强有力的工具。
KEY HARDWARE SPECIFICATIONS:
Writing Speed: up to 10 M pixels/s Best in class!
Resolution: 16 Bit, writing field size of 50000 x 50000 pixels Best in class!
Implemented Shapes: dot, single pixel line, rectangular primitives (spiral or meander fill), trapezoidals, triangles, parallelograms, arrays, 3rd order polynomials, circles, rings or ring segments import of image files (*.bmp, *.jpg ...), GDS II and AutoCad/ Autosketch *.dxf
Writing Clock: 10 MHz with <2ns dwell time control Best in class!
Digital Full Bandwidth Field Correction: scaling, rotation, orthogonality, shift and trapezoidal correction
Mark Detection Input: analog input for image detector output (adjustable gain and offset) with 12 Bit sampling, single line scan, selected area or full frame
Deflection Outputs: Analog outputs up to +/- 10 V Best in class!
Blanker Output: TTL output with adjustable polarity or optional fiber optics output
溢鑫科创科技集团为您提供电镜纳米图形发生器(电子束光刻)XENOS,XENOSXENOS产地为德国,属于电子束曝光机,除了电镜纳米图形发生器(电子束光刻)的参数、价格、型号、原理等信息外,还可为您提供无掩模激光直写光刻机、超高分辨多靶材离子溅射仪,溢鑫科创客服电话400-860-5168转2856,售前、售后均可联系。