单层二硫化钼-单层二硫化钼
参数:制备方法:锂基插层法组成:单层二硫化钼外观:黑色粉末或分散体直径:0.2~5um,主要集中在1um-3um厚度:1纳米单分子层比例:95%Parameter:Preparation Method:Lithium-based Intercalation MethodComposition:Monolayer Molybdenum disulfideAppearance: Black Powder or dispersionDiameter: 0.2-5 μm, mainly concentrate in 1μm-3μmThickness: ~1 nmMonolayer ratio: =95%