CompanyProfileSemiMapScientificInstrumentsGmbHdevelopsmeasurementsystemstoevaluateelectricalpropertiesofsemi-insulatingcompoundsemiconductorsubstrates.GaAs,InP,SiC,GaNandCdTewafersarechearacterizedbySemiMapsystemswithrespecttoresistivity,mobilityandcarrierconcentration.Thenon-destrucivecontactlesscapacitivemeasurementtechniquerequiresnosamplepreparationandgeneratesfullwaferresistivitytopogramsrevealinglateralvariationsassmallas1%withhighlateralresolution.SemiMapAnalyticalSystemsEvaluationofelectricalmaterialpropertiesResistivityr=Q0t(Q¥ ee0)-1Mobilityµ =1/B[r(B)/r(0)-1]½ ActivationenergyEa=(kT1T2)/(T2-T1)*ln[r(T1)/r(T2)]COREMA-WTMeasuressusbtrateresistivity.Contactlessmappingofwafersupto200mmindiameter,1mmresolution resistivityrange1x105to1x1012W-cm automatedmeasurementroutines,statisticalanalysis.COREMA-VTMeasuressubstrateresistivityatvariabletemperaturerangefromroomtemperatureupto400oC evaluationofcarrieractivationenergyviaArrheniusplotCOREMA-ERMeasuressheetresistance(105W)ofepitaxialbufferlayers calculatelayerresistivityforgiventhickness.======================================================================================================COREMA-WTTheCOntactlessREsistivityMApperdesignedforWaferTopography(COREMA-WT)isahighperformancediagnostictooltocharacterizetheresistivityofsemi-insulatingsemiconductorwaferswithutmostprecision,repeatabilityanddetail.Fullwaferresistivitytopogramsdiscernfluctuationsinthepercentrangewithlateralresolutionbelow1mm.Itisusedforroutineproductioncontrolaswellasin-depthanalysissupportingmaterialdevelopment.Analyticmethodstodiscernandquantifylocallyinhomogeneousmaterialhavebeenelaborated.=====================================================================================================COREMA-RMTheCOREMA-RMsystemdeterminesthefullsetofelectricaltransportparameters(Resistivity,carrierMobilityandcarrierconcentration).ItreplacescompletelytheconventionalHallmeasurementsbyacontactlessprocedurewhichisvastlysuperiorinspeedandreproducibility.Datamaybetakenatanydesiredspotonwafersupto200mm.&bull Probediameter1mm&bull Samplediameter10mm&ndash 100mm&bull Manualloading&bull Freechoiceofmeasurementposition&bull Mobility1000cm2/VsISSUECONVENTIONALHALLCOREMA-RMWafercuttingnecessaryNon-destructiveOhmiccontactsneeded,criticalobsoleteSamplepreparation~15minnoneSampleinsertionandmeasurementtime~10min~30sRepeatability~5%1%EvaluationofSImaterialdifficulteasyApplicabilitygeneralSImaterialonlyµ 1000cm2/VsAcceptancestandardmethodnewmethod=======================================================================================================COREMA-VTTheCOREMA-VTsystemisdesigne
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