美国 OAI 光刻机 Model 200 型桌面掩模对准器系统 完全手工操作。输出光谱范围:Hg: G(436海里),H(405海里),I(365nm)和310nm线,Hg-Xe: 260nm和220nm或LED: 365nm, 395nm, 405nm。衬底从块大小8平方。互换抛掷和面具。紫外灯功率范围从200到2000 w。选择紫外LED光源(365 nm和405 nm)。空气轴承真空吸盘。接近(15-20um): & lt 3.0 - 5.0, 软接触:2.0um,硬触点:1um和真空接点:≤0.5um。对齐模块X, Y,和Z轴和θ。双通道光学反馈。只提供正面接触w / IR选项。可用在桌面选项只适用于研发及独立工作。.占用空间小。适用于生物学、微机电系统、半导体和 Microfludics CLiPP应用程序 Model 200 Table Top Mask Aligner SystemComplete Manual Operation。 Output Spectra Range: Hg: G (436nm), H (405nm),I(365nm) and 310nm lines, Hg-Xe: 260nm and 220nm orLED: 365nm, 395nm and 405nm。Substrate Sizes from Pieces to 8” sq。 Interchangeable chucks and mask holders。 UV Lamp Power range from 200 to 2,000W。Option for UV LED (365nm and 405nm) Light Source。 Air bearing vacuum chuck。 Proximity (15-20um): 3.0 – 5.0um, Soft Contact:2.0um, Hard contact: 1um and vacuum contact : ≤ 0.5um。Alignment module X, Y, and Z axis and theta。 Dual-channel optical feedback。 Provides Front side exposure only w/ IR Option。 Available in Table top option only and applicable for R&D and standalone work。 Small Footprint。 Applicable for Biology, MEMS, Semiconductor and Microfludics, CLiPP application
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