单层二硫化钼-纳米尺寸单层二硫化钼
参数:制备方法:锂基插层法组成:单分子层,具有小尺寸的二硫化物外观:黑色粉末或分散体直径:20-500 nm,主要集中在100-200 nm厚度:1纳米单分子层比例:95%Parameter:Preparation Method:Lithium-based Intercalation MethodComposition: Monolayer Tungsten disulfide with small sizeAppearance: Black powder or dispersionDiameter: 20-500 nm, mainly concentrate in 100-200 nmThickness: ~1 nmMonolayer ratio: =95%