牛津仪器PlasmaPro 100 等离子体刻蚀系统-2017 PlasmaPro-100-Brochure-CN

Delivers reactive species to the substrate, with a uniform high conductance path through the chamber, allowing a high gas flow to be used while maintaining low pressure Electrodes available for temperatures from -150ºC to +400ºC with helium backside cooling and a range mechanical clamp designs ? Optimised hardware and control to deliver processes requiring fast process step switching, e.g. Bosch Variable height electrode can utilise the 3-dimensional characteristics of the plasma and accommodate substrates up to 10mm thick at optimum height Range of ICP source diameters; 65mm, 180mm and 300mm