方案摘要
方案下载应用领域 | 环保 |
检测样本 | 废气 |
检测项目 | 分子态无机污染物>其它 |
参考标准 | - |
Hydride gases, such as phosphine and arsine, are important contaminants in process chemicals used in both the petrochemical and semiconductor industries. For example, the presence of phosphine, arsine, hydrogen sulfide and carbonyl sulfide in polymer grade ethylene or propylene can have a deleterious effect on catalysts used in the production of polypropylene plastics. Accurate data on the concentrations of these contaminants at trace levels enables prediction of catalyst lifetime and minimizes production downtime.In the semiconductor industry, phosphine is used as a precursor for the deposition of group III-V compound semiconductors, and as a dopant in the manufacturing of semiconductor devices, such as diodes and transistors. In the case of group III-V compound materials, such as indium phosphide (InP), absence of other hydride dopant impurities e.g., silane, germane or hydrogen sulfide (and moisture) is critical, as they can have a profound effect on the performance of the final device. In particular, incorporated sulfur from hydrogen sulfide and carbonyl sulfide may affect the electrical properties of
单克隆抗体的高分离度、高通量体积 排阻色谱分析
采用液相色谱-四极杆串联飞行时间高分辨质谱分析锂电池中的碳酸酯有机溶剂组分
使用 Agilent 5800 ICP-OES 测定固态 电解质锂镧锆钽氧 (LLZTO) 中的 主量元素
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