资料摘要
资料下载LaNiO3 LNO electrode was intensively studied as electrodes because LNO has a pseudocubic perovskite crystal structure with a lattice parameter of 3.84 Å. But the etching process of LNO thin films must be developed in order to realize highly integrated ferroelectric random access memories. In this work, we investigated etching characteristics and mechanisms of LNO thin films using inductively coupled BCl3 /Ar plasma ICP system. The maximum etch rate of LNO thin films was 41.1 nm/min at a BCl320/Ar80 gas mixing ratio. The positive ions and the ion energy distributions were measured with a quadrupole mass spectrometer QMS. As rf power and dc bias voltage increased and working pressure decreased, the ion energy and etch rates of LNO thin films were increased. A chemically assisted physical etch of LNO was experimentally confirmed by ICP system and QMS measurements.The positive ions and the ion energy distributions IEDs were measured with a Hiden EQP plasma probe Hiden Analytical Ltd., EQP 510.
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The Method, Hardware and Performance of the PTR3
简介：The PTR3 is a specialized system dedicated to the highly sensitive detection of ultra low traces of volatile organic compounds and their oxidation products that enables monitoring reactions from the first oxidation steps up to highly-oxygenated organic molecules (HOMs) down to ppqV levels (Breitenlechner et al., 2017). The inlet system and the ionization chamber are especially designed to reduce surface interactions. This concept of contact free sampling allows for detecting organics of virtually all volatility classes ranging from volatile (VOC) to extremely low volatile (ELVOC). Recent results from the well-known CLOUD experiment very well illustrate the advantages of the PTR3 over a commonly used nitrate (NO3-) Chemical Ionization Mass Spectrometer (CIMS). Both instruments show a similar detection efficiency towards ELVOCs, but the PTR3 clearly excels the CIMS when it comes to the detection of less oxidized VOCs. https://www.ionicon.com/technologies/details/ptr3
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