* 为了确保能产生干涉,请检查所用的光源的相干长度大于光程长(ΔOPL)的近似改变。当使用光源的相干长度接近ΔOPL的几倍,干涉条纹的对比度会下降。一旦相干长度接近ΔOPL,实际上是在对非相干光有效成像。假设平行反射表面被厚度分开,对于UVFS(n=1.457@632.8纳米),计算的ΔOPL列在上表中。
Item # |
Included
Plate* |
Compatible Plates |
Compatible
Accessories |
Threaded
Mounting Holes |
SI035 |
SI035P |
SI035P, SI050P, SI100P, and SI254P |
SIVS, SITST** |
8-32 and M4 |
SI050 |
SI050P |
SI035P, SI050P, SI100P, and SI254P |
SIVS, SITST** |
8-32 and M4 |
SI100 |
SI100P |
SI035P, SI050P, SI100P, and SI254P |
SIVS, SITST** |
8-32 and M4 |
SI254 |
SI254P |
SI035P, SI050P, SI100P, and SI254P |
– |
8-32 and M4 |
SI500 |
SI500P |
SI500P |
– |
1/4"-20 and M6 |
* 楔形板用UVFS制成
** 机械尺寸:Ø30.5毫米x 50.0毫米
|