电容中耦合射频放电的电子加热检测方案(CCD相机)
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耦合射频放电的电子加热
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Electron heating, mechanisms of plasma generation, and electron dynamics in dif-
ferent types of capacitively coupled radio frequency (CCRF) discharges relevant for
industrial applications are investigated by a combination of di®erent experimen-
tal diagnostics, simulations and models. Geometrically symmetric and asymmetric
single frequency discharges operated at low pressures, geometrically symmetric dual
frequency discharges operated at two substantially di®erent frequencies and two sim-
ilar frequencies (fundamental and second harmonic with variable phase shift between
the driving voltages) as well as hybrid capacitively/inductively coupled (CCP-ICP)
RF discharges are studied. Electron heating is found to be strongly a®ected by
phenomena characteristic for a certain discharge type, that do not occur in another.
At low pressures the generation of highly energetic electron beams by the expand-
ing sheath is observed. Such beams propagate through the entire plasma bulk and
are re°ected at the opposing plasma boundaries, if the electron mean free path is
long enough. An analytical model demonstrates that these beams lead to an en-
hanced high energy tail of the electron energy distribution function and are, there-
fore, closely related to stochastic heating
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