型号: | C-Focus™ System |
产地: | 美国 |
品牌: | MCL关注纳米 |
评分: |
![]() ![]() ![]() ![]() ![]() |
![]() ![]() |
Features
![]() | Typical Applications
|
Product Description |
C-Focus™ systems provide an automatic means to eliminate microscope focus drift over long time periods. Unlike autofocus systems which require use of advanced microscopes with internal focus correction or external devices which track video signals or reflected laser beams, the C-Focus™ simply corrects for microscope focus drift by using a high resolution (5nm) sensor system to measure the lens/sample spacing and make the necessary adjustments. The C-Focus™ system has no effect on standard manual focusing and can be retrofit to any microscope. After focus is established, simply pushing the “focus lock” button starts the C-Focus™ operation. Objective lens motions are accomplished with a lens nanopositioner (the Nano-F100S) which is easily connected to the objective lens and microscope with standard threaded adapters. In addition to the unique C-Focus™ operation, lens nanopositioner motion can also be directly commanded by digital (16-bit USB) or analog signals and can be used for high speed, high resolution confocal imaging and other imaging tasks with demanding focus requirements. The C-Focus™ lens positioning system contains the same proprietary, low noise PicoQ® position sensors used in the Nano-F100S and is capable of sub-nanometer positioning resolution. The 16-bit USB digital computer interface is included with all C-Focus™ controllers.![]() |
|
|
Focus Drift vs. Constant Focus |
.![]() ![]() |
Technical Specifications | |
Range of motion (Nano-F100) | 100 μm |
Resolution | 0.2 nm |
Resonant Frequency | 500 Hz ±20% |
Stiffness | 1.0 N/μm |
Recommended max. load* | 0.5 kg |
Body Material | Al and Brass |
Controller | C-Focus™ |
* Larger load requirements should be discussed with our engineering staff. |
Additional Information | |
Nano-F100 Drawing![]() | C-Focus™ System![]() |
Related Products |
|
相关产品
汽车光学检测系统AIS
PT403型波长可调谐皮秒激光器
ANL系列高能量高重复频率DPSS纳秒激光器
APL4206 系列高能量皮秒激光放大器
UltraFlux FF/FT 5000 高能量可调谐飞秒激光器系统
UltraFlux FT300型波长可调谐飞秒激光器系统
Ekspla 超高功率激光器系统SYLOS 2A
LaVision PTUx 可编程时间控制单元
LaVision 用于粒子成像测速PIV的相机
LaVision StrainMaser 全场应变测试系统组件
LaVision 用于数字图像相关DIC的相机
LaVision StrainMaster 数字图像相关分析软件包
LaVision 标定板
LaVision StrainMaster 形变应变成像测量系统
LaVision StrainMaster DVC 体视全场应变测量系统
关注
拨打电话
留言咨询