高放大倍数高分辨率校准标样

高放大倍数高分辨率校准标样

参考价:面议
供货周期: 一周
品牌:
规格: 145nm
货号: 642
CAS号:
广州竞赢科学仪器有限公司
金牌会员16年生产商
关注展位 全部试剂
产品详情

Precision holographic pattern for accurate calibration for high resolution, nanometer scale measurements.

Period: 145nm pitch nominal, one dimensional array. Accuracy is +/- 1nm. Calibration certificate will give the actual pitch of the standard.
Surface structure: Aluminum lines on glass, 4x6mm dimensions. Line height (about 100nm) and line width (about 75nm) are not calibrated.
Usability: The calibrated pattern covers the entire standard. There is sufficient usable area to make tens of thousands of measurements without reusing any areas contaminated or altered by previous scans.
AFM: Use in contact, tapping and other modes with image sizes from 250nm to 10um. Available unmounted or mounted on a 12mm steel AFM disk.
Certification: Comes with a non-traceable manufacturer’s certificate stating average pitch, based on batch measurements.

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