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  • 悬赏金额:16积分状态:已解决
  • 【序号】:
    【作者】: Yanqiu Li , Yuan Zhou
    【题名】: Optimization of resolution-enhancement technology and dual-layer bottom-antireflective coatings in hypernumerical aperture lithography
    【期刊】: J. Vac. Sci. Technol. B
    【年、卷、期】: 2008,26(2)
    【全文链接】: http://scitation.aip.org/vsearch/servlet/VerityServlet?KEY=FREESR&smode=strresults&sort=chron&maxdisp=25&threshold=0&possible1=Yanqiu+li&possible1zone=author&bool1=and&possible2=yuan+zhou&possible2zone=author&OUTLOG=NO&viewabs=JVTBD9&key=DISPLAY&docID=3&page=1&chapter=0

dong3626 2009/04/22

[img]https://www.instrument.com.cn/bbs/images/affix.gif[/img][url=http://www.instrument.com.cn/bbs/download.asp?ID=146022]Optimization of resolution-enhancement technology and dual-layer bottom-antireflective coatings in hypernumerical aperture lithography [/url]

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