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Samples to be measured：

1、Mono- and multi-crystalline wafers；2、Square or pseudo square；3、Textured or non-textured surface；4、Diffused layer (n+p or p+n)；5、Wafers without contacts, cells with contacts6、Edge-isolated。

Wafer size：

100 … 156 mm。

Measurements：

Testing of edge isolation resistance by 2-point probing。

Sample preparation：

Wafers after diffusion and edge isolation。

measured area：

Whole wafer。

Measurement time：

App. 5 sec. per wafer。

System dimensions(W x H x D)：

220mm x 150mm x 300mm (ISO-TEST unit)90mm x 50mm x 110mm (Multimeter)200mm x 30mm x 110mm (Switch)。