| 型号： | Picosun |
| 产地： | 芬兰 |
| 品牌： | Picosun |
| 评分： |
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Picosun的原子层沉积（ALD）反应堆的微型和纳米技术应用的领先制造商。提供的Picosun的客户提供灵活的，可靠的和用户友好的ALD工艺工 具，它提供了从基础研究到全自动高通量工业生产世界领先的工艺品质和独特的可扩展性。
Picosun™ ALD工艺工具专门提供给欧洲，美国，亚洲和澳大利亚的各种突出的行业和高层次専题研究机构。
拥有的Picosun世界各地的销售和支持网络，分销商和代表处分布在全球30个国家。
PICOSUN™ R-series Atomic Layer Deposition (ALD) reactors are optimized for research,
product development and pilot production. The versatile reactor design enables
deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates.
PICOSUN™ P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD
production tools, providing extremely fast process times and very low cost of ownership
with the patented design solely based on the requirements of the ALD method.
PICOBATCH™ ALD system
To answer the challenge of ALD having a reputation of a "slow" method,
PICOSUN™ Pseries batch system can be fully automated and capable of coating hundreds or
even thousands of wafers per hour, with several batch ALD reactors clustered together and
operated with an industrial robot. Picosun ALD process tools are well known for the fact that
their generic design allows results of research to be smoothly turned into production use.
PICOSUN™ Pseries ALD tools are a prime example of this, offering Picosun's trademark fast,
reliable, versatile and uniquely upscaleable high volume ALD manufacturing without
compromising even the strictest industrial quality and repeatability standards. Excellent film
uniformities in batch (thickness STD < 1 % with Al2O3 on up to 300 mm silicon wafers), and
particle level down to 2 added particles/ wafer have been achieved by numerous customers
on three continents.
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