产品详情
仪器简介:
Woosin公司生产的MPECVD为一高效微波等离子体制备设备,可用于生长金刚石薄膜、碳纳米管、氮化硅、碳化硅等超硬膜,具有生长速度快、制备温度低、性价比高等优点,已有韩国、中国(含香港地区)等许多大学与研究机构使用。
应用领域:
1) Si3N4;
2) SiO2;
3) cubic BN or cBN;
4) SiC;
5) C3N4;
6) nano-crystalline diamonds or nc-diamonds;
7) diamond-like-carbon or DCL;
8) micro-crystalline silicon or m-silicon;
9) hexagonal BN or hBN;
10) carbon nanotubes or CNTs;
11) carbon nano-fibers or CNFs;
12) highly-oriented diamonds or HODs.
技术参数:
MWPECVD-RX:
1. DC Plasma CVD, RF Plasma CVD,Microwave Plsma CVD
2. Atmospheric Microwave Plasma Source
3. Large diameter(6")
4. Max. 6" Sample
5. Upto 900℃ heating
6. Double-wall, Stainless Steel Reaction Chamber
7. 2KW microwave power generator(standard)
主要特点:
1.Diamond/CNT Growing
2.400mm OD Stainless Steel Chamber
3.4 inch Substrate for Diamond
4.6 inch Substrate for remote operation
5.RF/DC Plasma option
详细信息请联系我们