Developments of plasma etching technology for fabricating semiconductor devices
Author(s): Abe H (Abe, Haruhiko)1, Yoneda M (Yoneda, Masahiro)2, Fujlwara N (Fujlwara, Nobuo)2 Source: JAPANESE JOURNAL OF APPLIED PHYSICS Volume: 47 Issue: 3 Pages: 1435-1455 Part: Part 1 Published: MAR 2008
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