【序号】：1 【作者】：C. Dhanavantri, R.N. Karekar, V.J. Rao 【题名】：Study of graded aluminium oxide films prepared by metal-organic chemical vapour deposition 【期刊】：Thin Solid Films 【年、卷、期、起止页码】:Volume 127, Issues 1-2, 10 May 1985, Pages 85-92 【全文链接】：http://www.sciencedirect.com/science/article/pii/0040609085902147
【序号】：2 【作者】：Chang Jin Kang, John S. Chun, Wong Jong Lee 【题名】：Properties of aluminium oxide films prepared by plasma-enhanced metal-organic chemical vapour deposition 【期刊】：Thin Solid Films 【年、卷、期、起止页码】：Volume 189, Issue 1, 1 August 1990, Pages 161-173 【全文链接】：http://www.sciencedirect.com/science/article/pii/004060909090036D
【序号】：3 【作者】：J. Fournier 【题名】：Preparation and characterization of thin films of alumina by metal-organic chemical vapor deposition 【期刊】：Thin Solid Films 【年、卷、期、起止页码】:Volume 23, Issue 1, January 1988, Pages 31-36 【全文链接】：http://www.sciencedirect.com/science/article/pii/0025540888902218
【序号】：4 【作者】：Sorina Garabagiu 【题名】：Thinning anodic aluminum oxide films and investigating their optical properties 【期刊】：Materials Letters 【年、卷、期、起止页码】:Volume 65, Issue 11, 15 June 2011, Pages 1648-1650 【全文链接】：http://www.sciencedirect.com/science/article/pii/S0167577X11002096
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