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  • 【序號】:1

    【作者】:Shon, C.H.; Park, J.S. ; Lee, J.K.

    【篇名】:Simulation of magnetron sputter with three-dimensional magnetic field

    【期刊】:Plasma Science, 1999. ICOPS '99.

    【全文連接】:http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=829565&url=http%3A%2F%2Fieeexplore.ieee.org%2Fxpls%2Fabs_all.jsp%3Farnumber%3D829565

    【序號】:2

    【作者】:Shuji Kondo and Kenichi Nanbu

    【篇名】:Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven discharge

    【期刊】:Journal of Vacuum Science & Technology

    【全文連接】:http://avspublications.org/jvsta/resource/1/jvtad6/v19/i3/p830_s1?isAuthorized=no

    【序號】:3

    【作者】:T. Yagisawa and T. Makabe

    【篇名】:Modeling of dc magnetron plasma for sputtering: Transport of sputtered copper atoms

    【期刊】: Journal of Vacuum Science & Technology

    【全文連接】:http://avspublications.org/jvsta/resource/1/jvtad6/v24/i4/p908_s1?isAuthorized=no

    【序號】:4

    【作者】:S. Dujko, R. D. White, Z. Lj. Petrović, and R. E. Robson

    【篇名】:Benchmark calculations of nonconservative charged-particle swarms in dc electric and magnetic fields crossed at arbitrary angles

    【期刊】: Phys. Rev.

    【全文連接】:http://pre.aps.org/abstract/PRE/v81/i4/e046403
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    第4楼2012/04/05

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  • 该帖子已被版主-zhumenjun1984加2积分,加2经验;加分理由:谢谢应助
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