【求助】这样翻译对吗？请指教

The remaining aluminum was then pattern and etch to from contacts on the polysilicon heaters and electrodes.
Finally the structures were released in a 49% HF etch..
Because the heater were 3mm long. They often stuck to the surface after the release. This was due to capillary forces from the rinse ofter the release. To alleviate this problem, a DI water/ IPA/ DI wafer / IPA rinse was incorporated followed by a 200℃ bake on a hot plate to suspend the structures.
剩余的铝是模式也是多晶硅上加热器和电极的触点。最后是在49%浓度的氟氢酸中刻蚀形成结构。
因为加热器3mm长，淋洗时产生的毛细管力使它们在形成后时常粘附在释放后的表面上，为了解决这个问题用去离子水/异丙醇/去离子水晶片/异丙醇冲洗，然后在200℃的热板上烘烤，使加热器与表面分离。