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【求助】求关于XPS的一些资料

  • feixiong5134
    2005/11/22
  • 私聊

XPS及其它能谱仪

  • 如果大家知道关于原位XPS的一些测量文献(英语的也行).在这里也谢谢shxie提供的那篇关于XPS英文文献,那正是我现在急需的.同时如果谁有原位XPS的原位安装流程图,麻烦您给发一份,谢谢.
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  • 第1楼2005/11/22

    什么原位,加热?成膜装置?你要做原位装置吗?

    feixiong5134 发表:如果大家知道关于原位XPS的一些测量文献(英语的也行).在这里也谢谢shxie提供的那篇关于XPS英文文献,那正是我现在急需的.同时如果谁有原位XPS的原位安装流程图,麻烦您给发一份,谢谢.

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  • 第2楼2005/11/22

    就是在XPS上面反应结束后,不经过大气经样品室降温后直接进入分析室进行分析,他们称作原位XPS.

    是的我要做原位XPS

    wuzl 发表: 什么原位,加热?成膜装置?你要做原位装置吗?

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  • 第3楼2005/11/22

    这种文献相对比较少,你看看那篇文献后面应用的相关文献有没有?
    原来我上载过一份oldtiger朋友提供的XPS资料,等会找到了再放上来吧。

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  • 第4楼2005/11/23

    根据你的叙述好象就是原位加热装置!能详细点,或列举一个具体的例子。你的仪器上不是有加热吗?

    feixiong5134 发表:就是在XPS上面反应结束后,不经过大气经样品室降温后直接进入分析室进行分析,他们称作原位XPS.

    是的我要做原位XPS

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  • 第5楼2005/11/23

    根据你的叙述好象就是原位加热装置!能详细点,或列举一个具体的例子。你的仪器上不是有加热吗?
    [/quote]

    因为我没有做过,所以我不知道我们怎么用,但是我觉得应该象这样的:The PHI 5000C ESCA system was modified for the XPS experiments. First, it was equipped with a pretreatment chamber for the sample degassing or prereaction, second, an Ar+ sputtering gun was assembled for depth profiling, third, a high-temperature 5-dimensional specimen manipulator supplied a temperature on the sample of up to 800 K, and last, pure oxygen could be introduced to the sample surface through an O2 doser which could be moved about 5mmfrom the sample in order to increase the exposing efficiency. After fixing it to the sample holder, the sample was transferred to the pretreatment chamber immediately.In there the sample was degassed under 1*10-6
    Torr for4htoremove the volatile contaminants. Then the sample
    was transferred without contacting the atmosphere into the
    analyzing chamber in which sample heating can be achieved by
    using an electric resistance heater through a tantalum slice
    equipped in the manipulator.AWRe3/WRe25 thermocouple was
    attached to the back of the sample for temperature measurement
    and control. After the sample was slightly sputtered to remove
    some involatile contaminants, exposure to O2 was performed
    while holding the sample at a certain temperature. XPS depth
    profiling was carried out by using an ion sputtering gun operated
    at 3.0 kV, 10 mA, and 5 *10-5 Pa of Ar to give a nominal
    sputtering rate of 2 Å/min, as calibrated via a Ta2O5 standard.
    The surface composition was obtained by fitting the XPS spectra
    of the corresponding elements in the alloys by considering their
    sensitivity factors. In the fitting, a Gaussian-Lorentzian line
    shape is employed assuming a linear background.


    还有您能告诉我这是什么意思吗?a Gaussian-Lorentzian line shape

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  • 第6楼2005/11/24

    谢谢您,我看的很慢,找到了一篇.麻烦您了,如果您找到那些资料通知我一下,我过去下载,麻烦您了,谢谢.

    shxie 发表:这种文献相对比较少,你看看那篇文献后面应用的相关文献有没有?
    原来我上载过一份oldtiger朋友提供的XPS资料,等会找到了再放上来吧。

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    +关注 私聊
  • 第7楼2005/11/24

    找我上载的资料里,已经上载了。

    feixiong5134 发表:谢谢您,我看的很慢,找到了一篇.麻烦您了,如果您找到那些资料通知我一下,我过去下载,麻烦您了,谢谢.

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