Samples to be measured: | 1、Mono- and multi-crystalline wafers;2、Square or pseudo square;3、Textured or non-textured surface;4、Diffused layer (n+p or p+n);5、Wafers without contacts, cells with contacts6、Edge-isolated。 |
Wafer size: | 100 … 156 mm。 |
Measurements: | Testing of edge isolation resistance by 2-point probing。 |
Sample preparation: | Wafers after diffusion and edge isolation。 |
measured area: | Whole wafer。 |
Measurement time: | App. 5 sec. per wafer。 |
System dimensions(W x H x D): | 220mm x 150mm x 300mm (ISO-TEST unit)90mm x 50mm x 110mm (Multimeter)200mm x 30mm x 110mm (Switch)。 |