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POLOS NanoWriter是一款多功能紫外激光书写器，具有高精度组件，专为用户提供在光敏层中创建微结构的最高自由度。
分辨率:0.8 - 2.5µm(5µm可选)
波长:405或375纳米
最大基材尺寸:110 × 110毫米
POLOS NanoWriter包括一个405 nm的光学模块，能够在光刻胶层中写入小至0.8微米的结构。这个用户友好的工具支持高达4095级的灰度或纯二进制模式，并允许2.5D光学结构，表面结构以及掩模项目。实时激光控制自动对焦和激光强度控制，确保整个曝光过程中的高质量成像。控制电子设备都安装在框架内，除了控制PC。这个基于微软windows的桌面PC和所有需要的软件都包含在包中。
好处
高品质，低成本的无掩模光刻工具
375nm源可用于i-Line电阻
市场符合0.8µm分辨率
紧凑的光模块:使用一个备用光单元，减少机器停机时间
用户友好的操作
支持高达4“x4”的基板
宽度:580mm
高度:708mm
深度:600mm(不含可选风道)
重量:260kg
压缩空气:5 - 7bar，空气质量符合ISO8573-1:2010 3级或以上
Maskless lithography offers a convenient way to create nanopatterns without the use of slow and expensive photomasks. This is particularly useful for research and rapid prototyping purposes. The POLOS® Beam is a budget compact solution that brings these benefits to your desktop without compromising on performance.
The POLOS® Beam Engine is a quick-swappable component that uses a UV laser beam to create a precise spot that can expose any pattern on a photoresist. To expose large wafers, precision steppers move the wafer, and multiple exposures are stitched together. The POLOS® Beam Engine can produce features smaller than (CD) 0.8 μm on a 5" wafer when equipped with a 405nm Engine and 20x objective.
Compact
Full-featured maskless lithography, smaller than a desktop computer.
Powerful
Sub-micron resolution while exposing a write field in less than two seconds.
Ultrafast Autofocus
Piezo-actuators reach focus in less than a second when combined with our close- looped focus optics.
No-fuss Multilayer
Semi-automatic alignment allows multilayer alignment to be completed within minutes.
The included software makes quick work of any patterning job; just load, align and expose. Navigation is similar to CNC systems.
200天
1年
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