Father of ICP-MS, Prof Sam Houk of Iowa State U he said in his Pittcon report for "Chemical and Engineering News", March 28, 2005 (Pittcon Issue) http://pubs.acs.org/cen/coverstory/83/8313pittcon.html
"The most interesting thing I saw was not really a new product but was cool nonetheless," Houk said, "Agilent recently reworked its collision cell ICPMS devices to generate across-the-board attenuations of many different polyatomic ion interferents, including metal-oxide ions and metal-argon adducts all under one set of operating conditions. A non reactive collision gas and kinetic energy discrimination are used to remove the interfering polyatomic ions." This design facilitates the reliable ICPMS determination of trace elements in unknown or variable matrices, he said. -
7500ce – Largest Working Concentration Range of any ICP-MS
工作曲线浓度范围及测试模式(所有元素在同一方法,同一套参数下测定,整个浓度范围无需改变仪器参数) Hg (0.01 – 2ppb) –标准模式 As (0.1 – 200 ppb) – 氦气模式 Se (0.1 – 200 ppb) – 氢气模式 Na (0.05 – 1180 ppm) –氦气模式
Overall calibration range 10ppt (Hg) to 1180 ppm (Na) in a single method- without attenuating ion transmission to increase working range
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