dong3626 2009/02/10
还是分开的好,, 这样,不容易看出来是两篇文献的 [img]https://www.instrument.com.cn/bbs/images/affix.gif[/img][url=http://www.instrument.com.cn/bbs/download.asp?ID=132196]2.2 REBL: A novel approach to high speed maskless electron beam direct write lithography[/url]
dong3626
第2楼2009/02/10
还是分开的好,,
这样,不容易看出来是两篇文献的
2.2 REBL: A novel approach to high speed maskless electron beam direct write lithography