第5楼2005/12/08
物理所设备
1
光学显微镜凹坑仪、超声打孔 制 样 设 备 05-11-4
2
Philips CM200/FEG场发射枪电镜 电 子 显 微 镜 05-11-4
3
LBS-2型离子薄化器 制 样 设 备 05-11-4
4
Gatan Model 691PIPS 减薄仪 制 样 设 备 05-11-4
5
日本产电解双喷仪 制 样 设 备 05-11-4
6
LBS-1型离子薄化器 制 样 设 备 05-8-8
7
Model 600氩离子减薄机 制 样 设 备 05-8-8
8
XL30 S-FEG扫描电镜(对外开放) 电 子 显 微 镜 05-8-8
9
Philips CM12透射电镜 电 子 显 微 镜 05-8-8
10
JEM-2010高分辨透射电镜（对外开放） 电 子 显 微 镜 05-8-8
11
Tecnai F20 super-twin 场发射枪透射/扫描透射电镜 电 子 显 微 镜 05-8-8
12
凹坑仪 制 样 设 备 04-9-8
13
尼康E400型生物显微镜 制 样 设 备 04-9-8
14
精密离子减薄仪 制 样 设 备 04-9-8
15
低角度离子薄化仪
第10楼2005/12/09
清华朱静组
1. Field Emission Gun Transmission Electron Microscope JEM-2010F
Point Resolution:0.23nm
Lattice Resolution:0.102nm
Max. Magnification: 1,500,000x
Acc. Voltage: 200kV
EDS, EELS, GIF, STEM, HAADF detector.
2 High Resolution Transmission Electron Microscope JEM-2011
3 Transmission Electron Microscope JEM-200CX
Point Resolution: 0.35nm
Lattice Resolution:0.14nm
Magnification: 900~650,000x
Acc. Voltage: 200kV
4 Ultrahigh Vacuum Scanning Probe Microscope JSPM-4500
5 Field Emission Gun Scanning Electron Microscope JSM-6301F
Secondary Electron Resolution: 1.5nm
Back-scattering electron resolution: 6.0nm
Magnification: 10~250,000x
EDS (B5-U92)
6 EBSP (resolution better than 1 degree)
Pulsed Laser Deposition System
Excimer Laser (Compex 205)
Pulsed Laser Deposition Instrument(PLD-IV)
Wavelength: 248nm
Pulse Energy: >650mJ
Max. Rep. Rate: 50Hz
Ultimate Pressure: 6.6x10-5Pa
Highest Deposition Temp. : 800°C
Target Specification: Φ10~60mm, 5~6mm thick,solid.
JPG560C II Multi-function Ultra-high Vacuum Magnetron Sputtering
Target position: standing structure of multi-targets sputtering and 3 radiate-frequency targets in 5.
Specimen position: 6 positions consisting of 5 water-cooling and one heating.
Heater: non-gap ajusting ~400°C(≤±2°C)
Demension of specimen:≤Φ40mm
Anneal heater: non-gap ajusting ~800°C
Vacuum limit:Main: 5x10-6Pa
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